Umhlinzeki Wezimboni/Ibanga Le-elekthronikhi TMAH 25% I-Tetramethylammonium Hydroxide Isithombe Esifakiwe

Umhlinzeki Wezimboni/I-Electronic Grade TMAH 25% Tetramethylammonium Hydroxide

Incazelo emfushane:

Igama lomkhiqizo: Tetramethylammonium hydroxide

INOMBOLO YECAS: 75-59-2

Ukubukeka: uketshezi olukhanyayo olungenambala

Isilinganiso: 25.0%,

Ukupakisha: 200kgs / isigubhu

I-Tetramethylammonium hydroxide (TMAH noma i-TMAOH) iwusawoti we-quaternary ammonium onefomula ye-molecular [(CH3)4N]+[OH]-, futhi iyilungu elilula kakhulu lekilasi lezinhlanganisela ze-organic quaternary ammonium.Enye yezindlela ezisetshenziswa ngayo ezimbonini iwukuba i-anisotropic etching ye-silicon.Iphinde isetshenziswe njenge-solvent eyisisekelo ekuthuthukisweni kwe-photoresist ene-acidic kunqubo ye-photolithography.Njengoba kuyi-catalyst yokudlulisa isigaba, iphumelela kakhulu ekukhumuleni i-photoresist.Ibuye isetshenziswe njenge-surfactant ekuhlanganiseni kwe-ferrofluid, ukuvimbela i-agglomeration.

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Email: daisy@shxlchem.com

Thumela i-imeyili kithi

Imininingwane Yomkhiqizo

Omaka bomkhiqizo

Incazelo

I-Tetramethylammonium hydroxide(TMAH noma i-TMAOH) usawoti we-quaternary ammonium onefomula yamangqamuzana [(CH₃)₄N]⁺[OH]^-, futhi iyilungu elilula kakhulu lekilasi lezinhlanganisela ze-organic quaternary ammonium.Enye yezindlela ezisetshenziswa ngayo ezimbonini iwukuba i-anisotropic etching ye-silicon.Iphinde isetshenziswe njenge-solvent eyisisekelo ekuthuthukisweni kwe-photoresist ene-acidic kunqubo ye-photolithography.Njengoba kuyi-catalyst yokudlulisa isigaba, iphumelela kakhulu ekukhumuleni i-photoresist.Ibuye isetshenziswe njenge-surfactant ekuhlanganiseni kwe-ferrofluid, ukuvimbela i-agglomeration.

Ukucaciswa:

Igama lekhemikhali	Isixazululo seTetramethylammonium hydroxide
Elinye igama	I-TMAH
CAS #	75-59-2
Ubumsulwa	25% min
Ifomula yamangqamuzana	(CH3)4NOH
Isisindo samangqamuzana	91.15
Chemical Properties	Uketshezi oluphuzi olungenambala olukhanyayo.Kulula ukumunca isikhutha, i-alkaline eqinile, igqwala.
Isicelo	1. Ama-catalysts wokudlulisa isigaba kukhemistri ye-organic synthetic. 2. Isixazululo se-anisotropic corrosion embonini ye-elekthronikhi, i-catalyst ye-polymerization yerabha ye-silicone neminye imikhiqizo ye-silicone
Ukupakisha	1KG, 25KG, 200kg, 1000KG IBC, ISO TANK

Ishidi Ledatha Yezobuchwepheshe/TDS:

Imininingwane	Into	Iyunithi	MIN	MAX
	Isivivinyo	%	24.90	25.10
	Umbala	I-Hazen		5
	CO₃^2-(Ikhabhonithi)	ppm		100
	Cl^-(Chloride)	ppm		0.1
	CH₃OH (Methanol)	ppm		40
	I-Li (Lithium)	ppb		5
	I-Na (Sodium)	ppb		10
	I-Magnesium	ppb		5
	I-Al (Aluminium)	ppb		10
	K (Potassium)	ppb		10
	I-Ca (Calcium)	ppb		10
	I-Cr (Chromium)	ppb		5
	Mn (Manganese)	ppb		5
	I-Fe (Iron)	ppb		5
	Ni (Nickel)	ppb		5
	I-Co (Cobalt)	ppb		5
	I-Cu (Copper)	ppb		5
	I-Zn (Zinc)	ppb		5
	I-Mo (Molybdenum)	ppb		5
	I-Cd (Cadmium)	ppb		5
	Pb (Okuholayo)	ppb		5
	I-Ag (Isiliva)	ppb		5
	Ingxenye >=0.5um	E/ml		100

Izakhiwo Zomzimba*	Ifomu	Uketshezi
	Indawo yokubilisa,°C	100.0
	Indawo yokubanda, °C	<-25.0
	I-Viscosity@25 °C,cst	2.8
	I-Gravity ethize @ 60 °F	1.022
	I-Flashpoint (i-Pensky Martens), °F	>200
	pH	>13

Ulwazi Lokuthumela	Izitsha
	200L isigubhu esihlanzekile
	Ezinye iziqukathi ezitholakalayo uma uzicelile.
	Ukuhlelwa Kokuthunyelwa
	Igama elifanele lokuthumela: i-tetramethylammonium hydroxide
	Ukuhlukaniswa kwezingozi: 8
	Inombolo kamazisi: UN1835, PGII

Ukuphepha Nokuphatha	Ukuze uthole imininingwane ethile yokuphepha kanye nokusingatha sicela ubheke ku
	I-Material Safety Data Sheet etholakala uma uyicela.

Amazwana*

I-Tetramethylammonium Hydroxide(2.380%,20.0%,ibanga logesi), i-TMAH (25%, 98%,ibanga lezimboni) nayo iyatholakala, sicela usithinte ukuze uthole imininingwane.

Isicelo

I-1) Esicini sokuhlaziya, i-tetramethylammonium Hydroxide ingasetshenziswa njenge-reagent ye-polarographic.

2) Mayelana nokuhlanzwa komkhiqizo, yayisetshenziswa njenge-alkali engenamlotha ukuze kudidiyelwe into ethile eyinsimbi.

3) embonini ye-elekthronikhi, ikakhulukazi njengomthuthukisi we-resister omuhle, i-silicon wafer wet etchant nesisombululo esihlanzekile kakhulu senqubo ye-CMP.

4) ekwakhiweni kwamasekethe ahlanganisiwe, izibonisi zekristalu eliwuketshezi, amabhodi esekethe aphrintiwe, ama-capacitor, izinzwa, nezinye izinto eziningi zikagesi.